Archive de presse
Analytik Jena with ICP Mass Spectrometers at the Winter Conference on Plasma Spectrochemistry (WCPS) in the USA
Jena (Germany), Tuscon (Arizona, USA), January 19, 2016 — Analytik Jena AG presented the PlasmaQuant® MS and the PlasmaQuant® MS Elite at the WCPS instrument exhibition for the first time and counted among the conferenceʼs speakers. The WCPS is the largest US scientific congress for plasma spectrochemistry. Following the acquisition of ICP-MS technology in September 2014, as well as the introduction of the market launch of PlasmaQuant® MS in February 2015 in Münster, Analytik Jena with PlasmaQuant MS Elite has now expanded its portfolio with a device with significantly improved resolution. The devices of the PlasmaQuant® MS series are applied, for example, in material analyses, food safety checks, pharmaceuticals, clinical chemistry, environmental monitoring, mining, or petrochemicals.
The talks at the WCPS focused on the fields of application, which are the most important for users in routine practice and research. Conceived as benchtop systems, the devices of Analytik Jena impress with a variety of technological developments that significantly improve their range of possible application in many different fields.
During the WCPS, developers and product specialists at Analytik Jena AG presented the new products in three different scientific forums. One discussion focused on explaining the advantages of laser coupling in research and routine applications. The PlasmaQuant® MS Elite’s extremely high sensitivity enables, for example, work with the smallest laser spot sizes and therefore requires only a minimum sample amount.
The Winter Conference on Plasma Spectrochemistry took place from January 10–16, 2016 in Tuscon, Arizona and was attended by more than 600 scientists and users from the area of instrumental analysis.
Conference Presentations:
LA-ICP-MS as a Flexible Tool for Quality Control and Research Applications, René Chemnitzer
Development and Characterization of a New High Sensitivity ICP-MS, Iouri Kalinitchenko
Trace Analysis of As, Bi, Ir, P and V in Very High-Purity Metals by High Resolution ICP-OES, Jan Scholz
Ready-to-print pictures can be downloaded at http://www.analytik-jena.de/en/company/press/downloads/photos-for-press-releases.html.